1 July 1990 Fabrication process for multilayer x-ray phase gratings
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Abstract
This paper describes a fabrication method for making multilayer coated phase reflection gratings and arbitrary phase patterned reflection optics suitable for soft x-ray imaging. This represents an improvement over previous fabrication methods using anisotropic or ion-beam etching, which were limited to amplitude structures by the induced roughness on the etched portions of the substrate. Included also is a scalar model for multilayer phase grating reflectivity.
Toby Sean Ross, Toby Sean Ross, Raymond T. Perkins, Raymond T. Perkins, Larry V. Knight, Larry V. Knight, } "Fabrication process for multilayer x-ray phase gratings," Optical Engineering 29(7), (1 July 1990). https://doi.org/10.1117/12.55658 . Submission:
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