1 July 1990 Multilayer diffraction gratings: application to synchrotron radiation instrumentation
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Optical Engineering, 29(7), (1990). doi:10.1117/12.153813
Abstract
Application of multilayer dispersion elements in the x-ray, soft x-ray, and extreme ultraviolet has been defined by their intrinsic properties, including large normal incidence reflectivities at wavelengths greater than 40 Å, low to moderate spectral resolution, and the ability to engineer unique capabilities into these optics as a result of their synthetic nature. In this paper the potential for extension of multilayers to high resolution applications is considered. A qualitative discussion of the characteristics of simple uniform multilayers required for high resolution is given first. Multilayer diffraction gratings are then considered and a simple analysis of their properties is presented. Application of such gratings in a multilayer-multilayer grating bending magnet synchrotron beamline monochromator is described, and the potential for efficient high resolution performance is discussed.
Troy W. Barbee, Jack C. Rife, William R. Hunter, Raymond G. Cruddace, Piero A. Pianetta, "Multilayer diffraction gratings: application to synchrotron radiation instrumentation," Optical Engineering 29(7), (1 July 1990). http://dx.doi.org/10.1117/12.153813
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KEYWORDS
Diffraction gratings

Synchrotron radiation

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