1 September 1990 Karhunen-Loève transform in optical microscopy: application to linewidth measurement
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Optical Engineering, 29(9), (1990). doi:10.1117/12.55685
Abstract
The linewidth measurement on wafers depends on the small local irregularities in the region being tested. Such defects must be first of all detected and then canceled in order to give an estimation of the average linewidth. Image processing based on the Karhunen-Loève transform of multiple acquisitions in different experimental conditions is proposed. Using statistical information compression, irregularities are easily detected and efficient noise filtering is performed.
Francois Vernotte, Daniel Charraut, Eric Lantz, Daniel A. Courjon, "Karhunen-Loève transform in optical microscopy: application to linewidth measurement," Optical Engineering 29(9), (1 September 1990). https://doi.org/10.1117/12.55685
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