1 May 1991 Comparison of ultrathin W-Si and W-C multilayers for x-ray optics
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Optical Engineering, 30(5), (1991). doi:10.1117/12.55834
Abstract
New magnetic materials and x-ray mirrors have lead to the preparation of multilayered structures (MLS) with ultrathin periodic layers. However, physical limitations appear for periods below some tens of A. In particular, fabrication tolerances relative to these ultrathin layer thicknesses are critical for the realization of effective MLS. In sputtering, the deposition rate is easily reproducible and can be maintained at a constant and low value for several hours; for this reason we are able to perform a large number (more than 100) of periodic ultrathin layers by this system (3 to 1.5 nm period). High Resolution Transmission Electron Microscopy (HRTEM) and x-ray reflectivity measurements are used to compare interfaces and stacking regularities for different samples with 140 layers. The W/Si MLS present a better quality of interfaces and structures compared to the W/C MLS.
Bernard Vidal, J. Marfaing, "Comparison of ultrathin W-Si and W-C multilayers for x-ray optics," Optical Engineering 30(5), (1 May 1991). http://dx.doi.org/10.1117/12.55834
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KEYWORDS
Reflectivity

Multilayers

Interfaces

X-rays

Transmission electron microscopy

Sputter deposition

Deposition processes

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