1 July 1991 Four-mirror optical system for UV submicrometer lithography
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Abstract
A design of a four-mirror optical system for submicron lithography using a KrF excimer laser beam (λ = 248 nm) is presented. By thirdorder aberration theory, analytic solutions for a telecentric, flat-field, anastigmatic four-spherical-mirror system (reduction magnification 5 x ) are found. Aspherization is carried out to the spherical mirror surfaces in order to reduce the residual higher order aberrations and vignetting effect. We obtain a reflection system useful in submicron lithographic application.
Sang-Soo Lee, Sang-Soo Lee, Sung Chan Park, Sung Chan Park, } "Four-mirror optical system for UV submicrometer lithography," Optical Engineering 30(7), (1 July 1991). https://doi.org/10.1117/12.55879 . Submission:
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