1 August 1991 Soft X-ray multilayers fabricated by electron-beam deposition
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We have investigated the optimum deposition conditions for fabricating Mo/Si multilayers on Si wafers by means of electron-beam deposition, taking the substrate temperature and deposition rate as parameters. Mo/Si multilayers made at substrate temperatures Of room ternperature to 420°C and at deposition rates of 0.02 to 1.0 nm/s were evaluated by transmission electron micrographs of their cross sections, x-ray diffraction patterns, and their spectral reflectances for soft x rays of 10 to 17 nm. The optimum deposition parameters were found to be 100 to 150°C and 0.02 to 0.2 nm/s, respectively, for substrate temperature and deposition rate. The Mo/Si multilayer made under the optimum condition showed fairly smooth layered structure and a reflectance of ~30% for unpolarized soft x ray of 14.6 nm at an incident angle of 20 deg.
Masaaki Sudoh, Ryouhei Yokoyama, Mitsuo Sumiya, Masaki Yamamoto, Mihiro Yanagihara, Takeshi Namioka, "Soft X-ray multilayers fabricated by electron-beam deposition," Optical Engineering 30(8), (1 August 1991). https://doi.org/10.1117/12.55908


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