1 August 1991 Soft X-ray multilayers fabricated by electron-beam deposition
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We have investigated the optimum deposition conditions for fabricating Mo/Si multilayers on Si wafers by means of electron-beam deposition, taking the substrate temperature and deposition rate as parameters. Mo/Si multilayers made at substrate temperatures Of room ternperature to 420°C and at deposition rates of 0.02 to 1.0 nm/s were evaluated by transmission electron micrographs of their cross sections, x-ray diffraction patterns, and their spectral reflectances for soft x rays of 10 to 17 nm. The optimum deposition parameters were found to be 100 to 150°C and 0.02 to 0.2 nm/s, respectively, for substrate temperature and deposition rate. The Mo/Si multilayer made under the optimum condition showed fairly smooth layered structure and a reflectance of ~30% for unpolarized soft x ray of 14.6 nm at an incident angle of 20 deg.
Masaaki Sudoh, Masaaki Sudoh, Ryouhei Yokoyama, Ryouhei Yokoyama, Mitsuo Sumiya, Mitsuo Sumiya, Masaki Yamamoto, Masaki Yamamoto, Mihiro Yanagihara, Mihiro Yanagihara, Takeshi Namioka, Takeshi Namioka, } "Soft X-ray multilayers fabricated by electron-beam deposition," Optical Engineering 30(8), (1 August 1991). https://doi.org/10.1117/12.55908 . Submission:


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