1 December 1992 Issues and method of designing lenses for optical lithography
Author Affiliations +
A variety of technologies to improve optical performance in photolithography are surveyed. The technologies are classified according to which component of the optics they work on: the source, the mask, the pupil, or the image. Emphasis is put on, first, the advantages and disadvantages of annular illumination, which are studied by lithography simulation. Second, a polarized mask is proposed. The effect of polarization on imaging, which has not been explored yet, is studied and the result is that TE polarization produces images of the best quality. Third, as a part of pupil function, aberration optimization is discussed. The conclusion is that positive spherical aberration is suitable for projection optics.
Koichi Matsumoto, Koichi Matsumoto, Tadao Tsuruta, Tadao Tsuruta, } "Issues and method of designing lenses for optical lithography," Optical Engineering 31(12), (1 December 1992). https://doi.org/10.1117/12.60024 . Submission:


Zoom lens design for projection optics
Proceedings of SPIE (September 23 2015)
Optical design of diffraction-limited monochromatic doublets
Proceedings of SPIE (September 25 1997)
New Projection Lenses For Optical Stepper
Proceedings of SPIE (August 20 1986)
The Design Of Large Ratio Wide Angle To Telephoto Zean...
Proceedings of SPIE (February 14 1986)

Back to Top