1 February 1992 Diffraction properties of a 0.24-μm period multilayer laminar amplitude grating in the soft x-ray region
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Optical Engineering, 31(2), (1992). doi:10.1117/12.56082
Abstract
We report on the fabrication of a laminar multilayer amplitude grating, characterization in the soft x-ray region, and modeling of its properties. Holographic lithography was used to produce a 0.24-μm spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu Lαβ line (1.33 nm). The results were interpreted in the framework of a scalar kinematic diffraction theory.
H. Berrouane, Chantal G. Khan Malek, Jean-Michel Andre, F. R. Ladan, Jean-Rene Rivoira, Robert J. Barchewitz, "Diffraction properties of a 0.24-μm period multilayer laminar amplitude grating in the soft x-ray region," Optical Engineering 31(2), (1 February 1992). http://dx.doi.org/10.1117/12.56082
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KEYWORDS
Diffraction gratings

Diffraction

Mirrors

X-rays

Sensors

X-ray diffraction

Plasma

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