1 September 1992 Film/substrate/vacuum-chuck interactions during spin-coating
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Optical Engineering, 31(9), (1992). doi:10.1117/12.59901
Abstract
Thickness variations that are associated with the vacuum chuck were observed in wet-chemical-derived dielectric films applied by the spin-coating technique. These thickness variations are controlled by factors such as the thermal properties of the substrate material, the evaporation behavior of the coating solution, and the physical design of the vacuum chuck. Atechnique is described for evaluating the magnitude ofthis effect.
Dunbar P. Birnie, Brian J.J. Zelinski, Stuart P. Marvel, Sharon M. Melpolder, Ronald L. Roncone, "Film/substrate/vacuum-chuck interactions during spin-coating," Optical Engineering 31(9), (1 September 1992). http://dx.doi.org/10.1117/12.59901
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KEYWORDS
Glasses

Silicon

Silicon films

Semiconducting wafers

Dielectrics

Coating

Metals

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