1 October 1993 Holographic mask aligner
Author Affiliations +
Optical Engineering, 32(10), (1993). doi:10.1117/12.145967
Abstract
Total internal reflection holography permits high-resolution, noncontact lithography over very large fields. A production lithographic system has been constructed employing specially developed illumination, focus, and alignment subsystems integrated onto a 6-in. substrate-handling mechanism. The system achieves an imaging resolution of 0.25 μm with a present overlay capability of ± 0.5 μm. A fine alignment system under development has demonstrated a 50-nm measurement accuracy. The technology is well suited to many applications, including the manufacture of flat panel displays, surlace acoustic wave devices, integrated optics, and optical storage disks.
Francis S. M. Clube, Simon Gray, Denis Struchen, Jean-Claude Tisserand, "Holographic mask aligner," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.145967
JOURNAL ARTICLE
7 PAGES


SHARE
RELATED CONTENT

Holographic mask-aligner
Proceedings of SPIE (June 01 1992)
Holographic lithography for microcircuits
Proceedings of SPIE (May 01 1990)
Large-field, high-resolution photolithography
Proceedings of SPIE (September 24 1997)
Microcircuit lithography using holographic imaging
Proceedings of SPIE (June 01 1990)

Back to Top