1 October 1993 Holographic mask aligner
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Total internal reflection holography permits high-resolution, noncontact lithography over very large fields. A production lithographic system has been constructed employing specially developed illumination, focus, and alignment subsystems integrated onto a 6-in. substrate-handling mechanism. The system achieves an imaging resolution of 0.25 μm with a present overlay capability of ± 0.5 μm. A fine alignment system under development has demonstrated a 50-nm measurement accuracy. The technology is well suited to many applications, including the manufacture of flat panel displays, surlace acoustic wave devices, integrated optics, and optical storage disks.
Francis S. M. Clube, Simon Gray, Denis Struchen, Jean-Claude Tisserand, "Holographic mask aligner," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.145967 . Submission:

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