1 February 1993 Design and development of a rotating wafer scanner
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Optical Engineering, 32(2), (1993). doi:10.1117/12.60850
Abstract
A rotating wafer scanner is designed and developed to determine its operational feasibility and advantages over a linear wafer scanner. The scanner is designed to operate at atmosphere. Each of its constituent parts were independently tested, and when the assembled system was evaluated, 0.2-μm-diam particle detectivity was observed.
Stavros Kalafatis, John F. O'Hanlon, Kenneth P. Gross, "Design and development of a rotating wafer scanner," Optical Engineering 32(2), (1 February 1993). http://dx.doi.org/10.1117/12.60850
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KEYWORDS
Semiconducting wafers

Scanners

Signal detection

Avalanche photodetectors

Particles

Light scattering

Sensors

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