A rotating wafer scanner is designed and developed to determine its operational feasibility and advantages over a linear wafer scanner. The scanner is designed to operate at atmosphere. Each of its constituent parts were independently tested, and when the assembled system was evaluated, 0.2-μm-diam particle detectivity was observed.
John F. O'Hanlon,
Kenneth P. Gross,
"Design and development of a rotating wafer scanner," Optical Engineering 32(2), (1 February 1993). https://doi.org/10.1117/12.60850