1 April 1993 Synthetic holograms written by a laser pattern generator
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Optical Engineering, 32(4), (1993). doi:10.1117/12.61207
Abstract
A new pattern generator, initially designed for ASIC fabrication, is employed for writing synthetic holograms and other micro-optical components. The specifications and limits of this machine are investigated. Test structures and synthetic holograms are shown. Arbitrary patterns with micrometer resolution, submicrometer positioning accuracy, large area patterns (up to 150 x 150 mm2 possible), and good quality microprofiles are demonstrated.
Ulrich W. Krackhardt, Johannes Schwider, M. Schrader, Norbert Streibl, "Synthetic holograms written by a laser pattern generator," Optical Engineering 32(4), (1 April 1993). http://dx.doi.org/10.1117/12.61207
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KEYWORDS
Holograms

Moire patterns

Diffraction

Diffraction gratings

Raster graphics

Zone plates

Lithography

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