1 April 1993 Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance material
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Optical Engineering, 32(4), (1993). doi:10.1117/12.132374
Abstract
A detailed chemical analysis was carried out on Spectralon, a highly Lambertian, diffuse reflectance material. Results of this investigation unambiguously identified the presence of an organic (hydrocarbon) impurity intrinsic to the commercial material. This impurity could be removed by a vacuum bake-out procedure and was identified as the cause of optical changes (degradation) that occur in the material when exposed to UV light. It was found that when this impurity was removed, the Spectralon material was photochemically stable and maintained its reflectance properties even after extensive solar UV exposure.
Albert E. Stiegman, Carol J. Bruegge, Arthur W. Springsteen, "Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance material," Optical Engineering 32(4), (1 April 1993). http://dx.doi.org/10.1117/12.132374
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KEYWORDS
Ultraviolet radiation

Chemical analysis

Reflectivity

Diffuse reflectance spectroscopy

Statistical analysis

Contamination analysis

Manufacturing

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