1 May 1993 Optical interference filters with continuous refractive index modulations by microwave plasma-assisted chemical vapor deposition
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Optical Engineering, 32(5), (1993). doi:10.1117/12.130253
Abstract
Optical interference filters that have continuously modulated refractive indices throughout their thicknesses (rugates) are designed and fabricated using a microwave plasma-assisted chemical vapor deposition technique. Examples are shown of single- and double-response narrowband reflection filters made from variable composition silicon oxynitride deposited on silica. Reflectivities in excess of 99.9% have been realized with bandwidths in the 2 to 10% range.
Adrian C. Greenham, Bruce A. Nichols, Roger M. Wood, Noorallah Nourshargh, Keith L. Lewis, "Optical interference filters with continuous refractive index modulations by microwave plasma-assisted chemical vapor deposition," Optical Engineering 32(5), (1 May 1993). http://dx.doi.org/10.1117/12.130253
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KEYWORDS
Refractive index

Optical filters

Optical coatings

Modulation

Silica

Silicon

Interference filters

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