The calculation results in a one-dimensional (1-D) interconnection system are proposed. The method of preparing phase-only masks with reactive ion etching is introduced. The masks are applied to a 1-D interconnection experiment. The experimental results are consistent with the theory.
"Optical interconnection with phase-only masks by means of reactive ion etching," Optical Engineering 32(8), (1 August 1993). https://doi.org/10.1117/12.143723