1 August 1993 Optical interconnection with phase-only masks by means of reactive ion etching
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Optical Engineering, 32(8), (1993). doi:10.1117/12.143723
Abstract
The calculation results in a one-dimensional (1-D) interconnection system are proposed. The method of preparing phase-only masks with reactive ion etching is introduced. The masks are applied to a 1-D interconnection experiment. The experimental results are consistent with the theory.
JingJuan Zhang, Chao Xu, Shiping Gao, "Optical interconnection with phase-only masks by means of reactive ion etching," Optical Engineering 32(8), (1 August 1993). http://dx.doi.org/10.1117/12.143723
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KEYWORDS
Etching

Optical interconnects

Reactive ion etching

Photomasks

Detector arrays

Energy efficiency

Free space optics

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