1 January 1994 Applications of single tapered glass capillaries: submicrometer x-ray imaging and Laue diffraction
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Optical Engineering, 33(1), (1994). doi:10.1117/12.149148
Abstract
A submicrometer-diameter x-ray beam from a tapered glass capillary is used to image micrometer-wide metal stripes on a lithography sample consisting of a 1000-Å-thick gold pattern on a silicon wafer substrate. An image of the gold pattern with submicrometer resolution is easily observed by measuring the transmission of x-rays through the sample as it is scanned in two dimensions. The size of the x-ray beam leaving the tip of the capillary was determined to be 0.10±0.01 μm by fitting a function to data obtained from transmission and fluorescence measurements as the edge of a gold stripe was scanned across the end of the capillary. Using the same capillary, Laue diffraction was observed from a 500-μm-thick silicon wafer in a 10-s exposure corresponding to an illuminated volume of 3.9 μm3. The x-ray intensity (flux/area) of the beam leaving the pipette was shown to be 960 times higher than the intensity entering the pipette, at 6 keV. As the ability to fabricate tapered capillaries improves, many new experiments with submicrometer x-ray beams including Laue diffraction from significantly smaller volumes should be possible.
Stephen Hoffmann, Daniel J. Thiel, Donald H. Bilderback, "Applications of single tapered glass capillaries: submicrometer x-ray imaging and Laue diffraction," Optical Engineering 33(1), (1 January 1994). http://dx.doi.org/10.1117/12.149148
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KEYWORDS
Capillaries

X-rays

Gold

Diffraction

X-ray imaging

Silicon

Lithography

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