1 November 1994 Antireflection-coated diffractive optical elements fabricated by thin-film deposition
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Abstract
The use of thin-film deposition in the fabrication of antireflection-coated diffractive optical elements is discussed. The antireflection coatings for these diffractive elements are optimized on the basis of an angular spectrum approach and the method of characteristic matrices. A minimum reflectivity as low as 1 x 10-4 is realized using in situ controlled multilayers of TiO2 and SiO2. The blazed profile of the diftractive optical elements is approximated by a stepped profile with up to 32 phase levels. The highest measured diffraction efficiency for 32-level Fresnel zone lenses was 97%.
Edgar Pawlowski, Berndt Kuhlow, "Antireflection-coated diffractive optical elements fabricated by thin-film deposition," Optical Engineering 33(11), (1 November 1994). https://doi.org/10.1117/12.179893
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