1 November 1994 Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists
Author Affiliations +
Optical Engineering, 33(11), (1994). doi:10.1117/12.179892
Abstract
A laser writing system for the fabrication of continuous-relief micro-optical elements in photoresist is described. The technology enables a wide range of planar micro-optical elements to be fabricated and replicated into polymer film using Ni shims electroformed from the photo-resist originals. The advantages and limitations of laser writing technology for micro-optics fabrication are discussed. Examples of fabricated micro-optical elements include Fresnel microlenses and microlens arrays, kinoforms, and other continuous-relief phase elements.
Michael T. Gale, Markus Rossi, Joern Pedersen, Helmut Schuetz, "Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists," Optical Engineering 33(11), (1 November 1994). http://dx.doi.org/10.1117/12.179892
JOURNAL ARTICLE
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KEYWORDS
Photoresist materials

Microlens

Optical components

Nickel

Photoresist developing

Laser applications

Microlens array

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