1 December 1994 Extreme-ultraviolet studies with laser-produced plasmas
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Abstract
A new multilaser multichannel spectrometer system has been developed that allows a wide range of investigations of the interaction of extreme-ultraviolet (EUV) photons with matter in the form of free atoms or ions, e.g., in gases or plasmas or bound as in solids. The EUV photons are generated by a laser-produced plasma. Applications to the study of photoabsorption by thin foils, gases, and ground- and excited-state atoms and ions are described. The design and performance of a collimated, quasi-monochromatic, intense source of EUV radiation based on the combination of a laser-produced plasma with a EUV multilayer mirror is also reported.
Eugene T. Kennedy, Eugene T. Kennedy, John T. Costello, John T. Costello, Jean-Paul Mosnier, Jean-Paul Mosnier, Attilio A. Cafolla, Attilio A. Cafolla, Martin Collins, Martin Collins, Laurence Kiernan, Laurence Kiernan, Ulrich Koeble, Ulrich Koeble, Muhammad H. Sayyad, Muhammad H. Sayyad, Matthew Shaw, Matthew Shaw, Bernd F. Sonntag, Bernd F. Sonntag, Robert J. Barchewitz, Robert J. Barchewitz, } "Extreme-ultraviolet studies with laser-produced plasmas," Optical Engineering 33(12), (1 December 1994). https://doi.org/10.1117/12.186393 . Submission:
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