1 December 1994 Tunable narrowband soft x-ray source for projection lithography
Author Affiliations +
EUV emission from laser plasmas produced on low Z target material such as plastics and araldites that contain 1 to 10% concentrations of the elements 50 ≤ Z ≤ 70 emit narrow regions of intense quasicontinua in the 6 to 13-nm wavelength range. The typical bandwidth of the emission is 0.5 to 1.5 nm and the features are brighter than any individual lines emitted from the host substrate materials. Similar spectra can be obtained from hydrated salts of these elements, so suitable targets can be prepared as compressed pellets of crystalline or hydrated salts or alternatively from oxides mixed into an araldite matrix. Spectra of tin salts prepared in this way provide an excellent narrowband source for 13.5-nm radiation for use with Mo/Si multilayers. Since the peak shifts toward shorter wavelengths with increasing Z, plasmas of these elements provide "tunable" narrowband EUV radiation sources.
Gerard D. O'Sullivan, Gerard D. O'Sullivan, Ronan Faulkner, Ronan Faulkner, } "Tunable narrowband soft x-ray source for projection lithography," Optical Engineering 33(12), (1 December 1994). https://doi.org/10.1117/12.186840 . Submission:


Debris generation from CO2 and Nd YAG laser produced tin...
Proceedings of SPIE (February 13 2008)
Optimizing an EUV source for 13.5 nm
Proceedings of SPIE (January 06 2004)
13.5 nm emission from composite targets containing tin
Proceedings of SPIE (May 05 2005)
4D inner shell excitations of I, Ba, and La in...
Proceedings of SPIE (June 02 2005)

Back to Top