1 March 1994 High-reflectivity patterned metal mirror used in an optically addressed spatial light modulator
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Abstract
We demonstrate an a-Si:H/su rface-stabilized ferroelectric liquid crystal (FLC) optically addressed spatial light modulator (SSFLC OASLM) incorporating a reflecting patterned metal mirror. The mirror, made using standard photolithographic techniques, has a three-layer structure containing two metal-matrix layers with an insulating layer between. Compared to a single metal-matrix layer, the gaps between the edges of pixels can be greatly reduced. With two metal-matrix layers, the principle advantages of a metal mirror over a dielectric stack reflector in FLC OASLMs are the metal layer's high capacitance and relatively achromatic reflectivity. A consequence of the metal-matrix pattern is that the effective reflectivity of the mirror is a function of the f/# of the read-beam-imaging optics. With f = 1/6, the theoretical maximum effective reflectivity is 0.91 Rmetal where Rmetal is the reflectivity of the metal. Our device has measured reflectivities as high as 0.52. The transmission coefficient of the mirror is measured to be as low as 0.017.
Qihong Wu, Stephen H. Perlmutter, Robert A. Rice, Garret Moddel, "High-reflectivity patterned metal mirror used in an optically addressed spatial light modulator," Optical Engineering 33(3), (1 March 1994). https://doi.org/10.1117/12.160965
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