1 April 1994 Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
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Abstract
For the wavelength region above the Si-L edge normal incidence, soft x-ray mirrors are produced with peak reflectivities close to 60%. The multilayer systems consist of molybdenum and silicon and are fabricated by electron beam evaporation in ultrahigh vacuum. A smoothing of the boundaries, and thereby a drastic enhancement of the reflectivity, is obtained by thermal treatment of the multilayer systems during growth. The thermal stability of the multilayer stacks could be improved considerably up to 850° C by mixing Mo and Si in the absorber layers and producing thus MoxSiy/Si multilayers with x and y denoting the amounts of Mo and Si in the absorber layer, respectively. First attempts are reported to produce mirrors with a bilayer thickness of 2.6 nm. An improvement in the quality of these interfaces can be obtained by bombardment with Ar+ ions. We report on normal incidence reflectivity measurements of the mirrors with synchrotron radiation and finally on the normal incidence diffraction efficiencies of a Mo/Si multilayer coated grating, for which values of 5.5% are achieved for the + 1'st and - 1'st diffraction orders.
Bernt Schmiedeskamp, Andreas Kloidt, Hans-Juergen Stock, Ulf Kleineberg, Thorsten Doehring, Michael Proepper, Steffen Rahn, Kerstin Hilgers, Bernhard Heidemann, Thorsten Tappe, Ulrich Heinzmann, Michael K. Krumrey, Peter Mueller, Frank Scholze, Klaus F. Heidemann, "Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings," Optical Engineering 33(4), (1 April 1994). https://doi.org/10.1117/12.163207
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