1 August 1995 High-carrier-frequency fan-out gratings fabricated by total internal reflection holographic lithography
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Optical Engineering, 34(8), (1995). doi:10.1117/12.205661
Abstract
Total internal reflection (TIR) holographic lithography is applied to the fabrication of binary diffractive optical elements with submicrometer surface relief features. The recording conditions for the intermediate TIR volume hologram, used for high-resolution proximity printing, are discussed. In particular, the fabrication of efficient high-carrier-frequency fan-out gratings is considered and experimental results are presented for an off-axis 9 x 1 fan-out element in photoresist with a carrier frequency of 1000 lines/mm.
Peter Ehbets, Hans Peter Herzig, Markku Kuittinen, Francis S. M. Clube, Yves Darbellay, "High-carrier-frequency fan-out gratings fabricated by total internal reflection holographic lithography," Optical Engineering 34(8), (1 August 1995). http://dx.doi.org/10.1117/12.205661
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KEYWORDS
Holography

Lithography

Reflection

Binary data

Diffractive optical elements

Holograms

Photoresist materials

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