1 September 1995 Spatial-frequency bandwidth in the photolithographic transfer of submicron gratings
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Optical Engineering, 34(9), (1995). doi:10.1117/12.200610
Abstract
The principle of the photolithographic mask transfer of high-spatial-frequency gratings under the Littrow angle is shown to be so tolerant that a broad spatial-frequency spectrum can be transferred under the same exposure conditions.
Olivier M. Parriaux, Henry Vuilliomenet, Pierre Sixt, Nathalie Cuny, "Spatial-frequency bandwidth in the photolithographic transfer of submicron gratings," Optical Engineering 34(9), (1 September 1995). http://dx.doi.org/10.1117/12.200610
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KEYWORDS
Photomasks

Scanning electron microscopy

Spatial frequencies

Chromium

Glasses

Helium cadmium lasers

Lamps

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