1 September 1995 Using conventional photolithographic glass masks as high-efficiency phase gratings
Author Affiliations +
Optical Engineering, 34(9), (1995). doi:10.1117/12.201811
Abstract
By patterning the iron oxide film of a conventional iron oxide mask it is possible to obtain a binary phase grating of high diffraction efficiency and high transmission that can be used in high-resolution displacement sensors.
Guy Voirin, Olivier M. Parriaux, Henry Vuilliomenet, R. Wildi, Ulrich Benner, S. M.O.L. Schneider, "Using conventional photolithographic glass masks as high-efficiency phase gratings," Optical Engineering 34(9), (1 September 1995). http://dx.doi.org/10.1117/12.201811
JOURNAL ARTICLE
4 PAGES


SHARE
KEYWORDS
Diffraction gratings

Iron

Oxides

Glasses

Diffraction

Computer programming

Polymethylmethacrylate

RELATED CONTENT

A novel projection for omni-directional video
Proceedings of SPIE (September 19 2017)
Lightning-rod effect near sharp dielectric structures
Proceedings of SPIE (March 25 2015)
Mobile shearography
Proceedings of SPIE (April 12 2005)

Back to Top