1 September 1995 Using conventional photolithographic glass masks as high-efficiency phase gratings
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Optical Engineering, 34(9), (1995). doi:10.1117/12.201811
Abstract
By patterning the iron oxide film of a conventional iron oxide mask it is possible to obtain a binary phase grating of high diffraction efficiency and high transmission that can be used in high-resolution displacement sensors.
Guy Voirin, Olivier M. Parriaux, Henry Vuilliomenet, R. Wildi, Ulrich Benner, S. M.O.L. Schneider, "Using conventional photolithographic glass masks as high-efficiency phase gratings," Optical Engineering 34(9), (1 September 1995). https://doi.org/10.1117/12.201811
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