1 September 1995 Using conventional photolithographic glass masks as high-efficiency phase gratings
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Abstract
By patterning the iron oxide film of a conventional iron oxide mask it is possible to obtain a binary phase grating of high diffraction efficiency and high transmission that can be used in high-resolution displacement sensors.
Guy Voirin, Guy Voirin, Olivier M. Parriaux, Olivier M. Parriaux, Henry Vuilliomenet, Henry Vuilliomenet, R. Wildi, R. Wildi, Ulrich Benner, Ulrich Benner, S. M.O.L. Schneider, S. M.O.L. Schneider, "Using conventional photolithographic glass masks as high-efficiency phase gratings," Optical Engineering 34(9), (1 September 1995). https://doi.org/10.1117/12.201811
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