1 May 1996 Pulsed-laser deposition of thin-film process characterization by optical spectroscopy
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Optical Engineering, 35(5), (1996). doi:10.1117/1.601028
Abstract
Spectral analysis of CO2-TE-laser-ablated plasma on YBa2Cu3O72-x targets demonstrates a very complex spectrum with emission lines from atomic and ionic species. Plasma temperature is estimated at different moments in its evolution. A good accordance with the values achieved by considering an adiabatic plasma expansion is obtained. Plasma emission intensity is studied as a function of laser pulse energy and, for the same incident energies, a very reproducible amplitude is evidenced. Using a hydrodynamic model, plasma parameters are calculated.
Ileana Apostol, Razvan Stoian, "Pulsed-laser deposition of thin-film process characterization by optical spectroscopy," Optical Engineering 35(5), (1 May 1996). http://dx.doi.org/10.1117/1.601028
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KEYWORDS
Plasma

Pulsed laser operation

Thin film deposition

Thin films

Laser energy

Copper

Gas lasers

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