1 January 1997 Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications
Author Affiliations +
Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of chemical vapor deposited (CVD) SiC mirrors provides an opportunity to extend the range of normal-incidence instruments down to 60 nm. CVD SiC is a highly polishable material yielding low-scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed.
Ritva A. M. Keski-Kuha, Ritva A. M. Keski-Kuha, John F. Osantowski, John F. Osantowski, Douglas B. Leviton, Douglas B. Leviton, Timo T. Saha, Timo T. Saha, Geraldine A. Wright, Geraldine A. Wright, Rene A. Boucarut, Rene A. Boucarut, Charles M. Fleetwood, Charles M. Fleetwood, Timothy J. Madison, Timothy J. Madison, } "Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications," Optical Engineering 36(1), (1 January 1997). https://doi.org/10.1117/1.601128 . Submission:


SiC challenging parts for GAIA
Proceedings of SPIE (November 20 2017)
CVD silicon carbide mirrors for EUV applications
Proceedings of SPIE (October 23 1995)
From Herschel to Gaia 3 meter class SiC space...
Proceedings of SPIE (September 27 2011)
Metal Multilayer Mirrors For EUV Wide Field Telescopes
Proceedings of SPIE (July 28 1989)

Back to Top