1 January 1997 Comments on fabrication parameters for reducing thermal drift on LiNbO3optical modulators
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Optical Engineering, 36(1), (1997). doi:10.1117/1.601172
Abstract
In this paper, some comments are made about fabrication parameters to reduce undesirable thermal drift in the optical output of z cut Ti:LiNbO3 (LN) modulators. In this regard, covering the LN surface with a semiconducting Si layer was reported to effectively shield the waveguides from pyroelectrically induced charges and to successfully suppress the drift1.
Hirotoshi Nagata, Satoshi Oikawa, Manabu Yamada, "Comments on fabrication parameters for reducing thermal drift on LiNbO3optical modulators," Optical Engineering 36(1), (1 January 1997). http://dx.doi.org/10.1117/1.601172
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KEYWORDS
Semiconducting wafers

Waveguides

Electrodes

Modulators

Silicon

Coating

Thermography

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