1 February 1997 Selected applications of photothermal and photoluminescence heterodyne techniques for process control in silicon wafer manufacturing
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Optical Engineering, 36(2), (1997). doi:10.1117/1.601216
Abstract
Two noncontact laser-based heterodyne techniques, photothermal heterodyne (PTH) and photoluminescence heterodyne (PLH), are introduced and applied to processing and quality control in silicon wafer manufacturing. The crystallographic characteristics of processinduced defects in silicon wafers are suitable for the application of PTH and PLH techniques, which are demonstrated on selected examples from different steps of silicon wafer production. Both PLH and PTH techniques meet the demand for nondestructive and on-line-suitable measurement in the semiconductor industry.
Andreas Ehlert, Michael Kerstan, Holger Lundt, Anton Huber, Dieter Helmreich, Hans-Dieter Geiler, Harald Karge, Matthias Wagner, "Selected applications of photothermal and photoluminescence heterodyne techniques for process control in silicon wafer manufacturing," Optical Engineering 36(2), (1 February 1997). https://doi.org/10.1117/1.601216
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KEYWORDS
Semiconducting wafers

Luminescence

Silicon

Heterodyning

Modulation

Reflectivity

Semiconductors

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