1 February 1997 Selected applications of photothermal and photoluminescence heterodyne techniques for process control in silicon wafer manufacturing
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Abstract
Two noncontact laser-based heterodyne techniques, photothermal heterodyne (PTH) and photoluminescence heterodyne (PLH), are introduced and applied to processing and quality control in silicon wafer manufacturing. The crystallographic characteristics of processinduced defects in silicon wafers are suitable for the application of PTH and PLH techniques, which are demonstrated on selected examples from different steps of silicon wafer production. Both PLH and PTH techniques meet the demand for nondestructive and on-line-suitable measurement in the semiconductor industry.
Andreas Ehlert, Andreas Ehlert, Michael Kerstan, Michael Kerstan, Holger Lundt, Holger Lundt, Anton Huber, Anton Huber, Dieter Helmreich, Dieter Helmreich, Hans-Dieter Geiler, Hans-Dieter Geiler, Harald Karge, Harald Karge, Matthias Wagner, Matthias Wagner, "Selected applications of photothermal and photoluminescence heterodyne techniques for process control in silicon wafer manufacturing," Optical Engineering 36(2), (1 February 1997). https://doi.org/10.1117/1.601216 . Submission:
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