1 April 1997 Technique for monolithic fabrication of silicon microlenses with selectable rim angles
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Abstract
Spherical microlenses are fabricated in a modified melting technology. Resist cylinders are patterned by photolithography and subsequently dissolved in a controlled solvent atmosphere. This technique enables the fabrication of spherical resist microlenses of selectable rim angles in the range from 1 to 30 deg. Photoresist microlenses with a focal length of 20 mm, a diameter of 1 mm and a good sphericity are realized. The photoresist lenses are transferred into the silicon substrate through reactive ion etching. Within the inner 80% of the lens diameter, the deviation of the silicon lenses from a sphere amounts to less than ?/20 at ?51.55?m. The resist and silicon lenses are characterized by mechanical and interferometric methods. This technology is compared with the well established melting technique.
Lars Erdmann, Dirk Efferenn, "Technique for monolithic fabrication of silicon microlenses with selectable rim angles," Optical Engineering 36(4), (1 April 1997). https://doi.org/10.1117/1.601300
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