1 May 1997 Single crystal silicon supported thin film micromirrors for optical applications
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Optical Engineering, 36(5), (1997). doi:10.1117/1.601349
Abstract
A novel process for fabrication of single crystal silicon supported torsional micromirrors with large dimensions (300 X 240 µm) is presented. The mirrors consist of a sputtered aluminum film on a layer of supporting oxide mounted on fully suspended single crystal silicon grids. The grids have an aspect ratio of 7:1 to provide a stiff backbone and to ensure flatness of the mirror surface. Thus the mirrors do not bend due to the internal stresses. A new idea of actuation of torsional structures is also presented. Vertical near-comb type actuators were fabricated to drive the torsional structures.
Zhimin Yao, Noel C. MacDonald, "Single crystal silicon supported thin film micromirrors for optical applications," Optical Engineering 36(5), (1 May 1997). http://dx.doi.org/10.1117/1.601349
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KEYWORDS
Mirrors

Silicon

Polishing

Semiconducting wafers

Actuators

Thin films

Micromirrors

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