Influence of nonuniform pupils in imaging periodical structures by photolithographic systems

Rosemarie Hild; Maria Josefa Yzuel; Juan C. Escalera; Juan Campos

doi:10.1117/1.601969

1 April 1998 Influence of nonuniform pupils in imaging periodical structures by photolithographic systems

Rosemarie Hild, Maria Josefa Yzuel, Juan C. Escalera, Juan Campos

Optical Engineering, Vol. 37, Issue 4, (April 1998). https://doi.org/10.1117/1.601969

We study nonuniform transmission filters to improve resolution and/or depth of focus (DOF) in lithography. To understand the behavior of these filters for periodic structures we study the changes produced by the defocus in the image of a five-bar test. We analyze the behavior of the system with different degrees of coherence. For partially coherent illumination, we use the apparent transfer function (ATF), which is defined by the contrast in the image of a cosine grating object of the corresponding spatial frequencies. We also compare the ATF for incoherent illumination with the optical transfer function (OTF).

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Rosemarie Hild, Maria Josefa Yzuel, Juan C. Escalera, and Juan Campos "Influence of nonuniform pupils in imaging periodical structures by photolithographic systems," Optical Engineering 37(4), (1 April 1998). https://doi.org/10.1117/1.601969

Published: 1 April 1998

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