1 October 1998 Dc drift reduction in LiNbO3 optical modulators by decreasing the water content of vacuum evaporation deposited SiO2 buffer layers
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Abstract
With increasing demand for LiNbO3 ~LN! optical intensity modulators for fiber communication systems, fine process control of LN device fabrication has become important to increase the fabrication yield and to supply low-priced modulators.
Hirotoshi Nagata, Hirotoshi Nagata, Masaru Shiroishi, Masaru Shiroishi, Toshinari Kitanobo, Toshinari Kitanobo, Katsumi Ogura, Katsumi Ogura, } "Dc drift reduction in LiNbO3 optical modulators by decreasing the water content of vacuum evaporation deposited SiO2 buffer layers," Optical Engineering 37(10), (1 October 1998). https://doi.org/10.1117/1.601824 . Submission:
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