1 February 1998 Superimposed grating wavelength division multiplexing in Ge-doped SiO2/Si planar waveguides
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Optical Engineering, 37(2), (1998). doi:10.1117/1.601873
Abstract
An improved model of wavelength division multiplexing (WDM) by superimposed gratings in planar waveguides has been developed. Based on this theory, principal design rules of N-channel WDM are established and a fanout capacity of 100 is estimated. Finally, fourchannel WDM at 840 nm has been demonstrated on a Ge:SiO2 /SiO2 /Si planar waveguide, which was hydrogenated to enhance its photosensitivity. The superimposed gratings were written using a narrow linewidth KrF excimer laser in an interferometric setup used in inscribing fiber Bragg gratings.
Andreas Othonos, J. Bismuth, M. Sweeny, Antoine P. Kevorkian, Jing Ming Xu, "Superimposed grating wavelength division multiplexing in Ge-doped SiO2/Si planar waveguides," Optical Engineering 37(2), (1 February 1998). https://doi.org/10.1117/1.601873
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