1 April 1998 Influence of nonuniform pupils in imaging periodical structures by photolithographic systems
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Optical Engineering, 37(4), (1998). doi:10.1117/1.601969
Abstract
We study nonuniform transmission filters to improve resolution and/or depth of focus (DOF) in lithography. To understand the behavior of these filters for periodic structures we study the changes produced by the defocus in the image of a five-bar test. We analyze the behavior of the system with different degrees of coherence. For partially coherent illumination, we use the apparent transfer function (ATF), which is defined by the contrast in the image of a cosine grating object of the corresponding spatial frequencies. We also compare the ATF for incoherent illumination with the optical transfer function (OTF).
Rosemarie Hild, Maria Josefa Yzuel, Juan C. Escalera, Juan Campos, "Influence of nonuniform pupils in imaging periodical structures by photolithographic systems," Optical Engineering 37(4), (1 April 1998). http://dx.doi.org/10.1117/1.601969
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KEYWORDS
Optical transfer functions

Image filtering

Coherence (optics)

Imaging systems

Optical lithography

Optical filters

Optical engineering

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