1 July 1998 Optical and x-ray characterization applied to multilayer reverse engineering
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Optical Engineering, 37(7), (1998). doi:10.1117/1.601700
Abstract
The complexity of optical thin film stacks leads to new techniques being developed for characterization of components after deposition. We show the complementarity between optical characterization techniques and grazing x-ray reflectivity. We illustrate the efficiency of that complementarity for the reverse engineering of a 7-layer mirror and a 50-layer bandpass filter.
Thierry Boudet, M. Berger, Oliver Lartigue, B. Hirrien, "Optical and x-ray characterization applied to multilayer reverse engineering," Optical Engineering 37(7), (1 July 1998). http://dx.doi.org/10.1117/1.601700
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KEYWORDS
Reverse engineering

Refractive index

X-ray optics

Reflectivity

X-rays

X-ray characterization

Silica

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