1 August 1999 Modeling scatter from silicon wafer features based on discrete sources method
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Optical Engineering, 38(8), (1999). doi:10.1117/1.602187
Abstract
The discrete sources method (DSM) is extended to investigate complete mathematical models for light scattering from various kinds of silicon wafers features. Computer simulations demonstrate the usefulness of the DSM for comparing scatter signals associated with different surface features. Wafer features such as contaminating particles, subsurface defects and pits are investigated.
Yuri A. Eremin, John C. Stover, N. V. Orlov, "Modeling scatter from silicon wafer features based on discrete sources method," Optical Engineering 38(8), (1 August 1999). http://dx.doi.org/10.1117/1.602187
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KEYWORDS
Particles

Scattering

Silicon

Semiconducting wafers

Light scattering

Polarization

Optical engineering

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