1 November 2000 0.13mm photolithography using inverse Fourier transform convolution filtering
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Optical Engineering, 39(11), (2000). doi:10.1117/1.1308172
Abstract
Discrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 µm is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3.
Chongxi Zhou, Xiangang Luo, Feng Boru, "0.13mm photolithography using inverse Fourier transform convolution filtering," Optical Engineering 39(11), (1 November 2000). http://dx.doi.org/10.1117/1.1308172
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KEYWORDS
Fourier transforms

Optical filters

Optical lithography

Convolution

Image filtering

Wavefronts

Light sources

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