1 November 2000 0.13mm photolithography using inverse Fourier transform convolution filtering
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Abstract
Discrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 µm is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3.
Chongxi Zhou, Chongxi Zhou, Xiangang Luo, Xiangang Luo, Feng Boru, Feng Boru, } "0.13mm photolithography using inverse Fourier transform convolution filtering," Optical Engineering 39(11), (1 November 2000). https://doi.org/10.1117/1.1308172 . Submission:
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