Xinyu Zhang Huazhong Univ. of Science and Technology (China) Qingle Tang Huazhong Research Institute of Electro-Optical Technology (China) Xinjian Yi Huangzhong Univ. of Science and Technology (China) Zhi Zhang,Xiandeng Pei Huazhong Univ. of Science and Technology (China)
Theoretical study indicates the potential for fabricating a noncircle cylindrical microlens array, a circle-shaped cylindrical microlens array, and a microprism array. Experimental results show that the cylindrical microlens arrays with surface profiles of a circle and an ellipse in a Si substrate have good surface quality and high uniformity. The relation curves between the Ar ion energy and the Ar ion-beam etching rate in several substrate materials such as ZrO2, InP, SiO2 (quartz glass), and Si and the photoresist (BP212) mask materials consolidated at relatively high temperature are given. The techniques utilized can be applied to fabricate a large-area cylindrical microlens array with different surface profiles and microprism array.