1 February 2000 Self-aligned photoresist patterning for integrated optics
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Optical Engineering, 39(2), (2000). doi:10.1117/1.602436
Abstract
This PDF contains the communications section which includes "Self-aligned photoresist patterning for integrated optics".
David F. Geraghty, Pekka Ayras, Ghassan E. Jabbour, Seppo Honkanen, Nasser Peyghambarian, "Self-aligned photoresist patterning for integrated optics," Optical Engineering 39(2), (1 February 2000). http://dx.doi.org/10.1117/1.602436
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KEYWORDS
Interferometers

Photoresist materials

Heterodyning

Waveguides

Birefringence

Dichroic materials

Optical lithography

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