1 January 1966 High Speed Macrophotography Used in Semiconductor Manufacturing
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Abstract
Discussed are the methods used in photographing contaminate particles of less than .006" size inside transistors while subjected to various frequencies and vibrations. Observation of wire forming dies and electrode welding of header posts in automatic equipment and a suggested method of adapting a microscope into a camera taking lens.
Paul C. Pfeiffer, "High Speed Macrophotography Used in Semiconductor Manufacturing," Optical Engineering 4(2), 040255 (1 January 1966). https://doi.org/10.1117/12.7971347 . Submission:
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