1 August 2002 Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio
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Optical Engineering, 41(8), (2002). doi:10.1117/1.1490589
Abstract
The signal-to-noise ratio required to obtain 10-nm accuracy in the measurement of lateral position is studied with an interference microscope. Evaluations are performed using the rigorous coupled-wave analysis (RCWA) modal approach and Hopkins image formation theory.
Alexander V. Tavrov, Michael Totzeck, Norbert Kerwien, Hans J. Tiziani, "Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio," Optical Engineering 41(8), (1 August 2002). http://dx.doi.org/10.1117/1.1490589
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KEYWORDS
Signal to noise ratio

Polarization

Microscopes

Image analysis

Interference (communication)

Interferometry

Optical engineering

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