Optical waveguide fabrication by combination of spin-on-glass and plasma-enhanced chemical vapor deposition for optoelectronic integration

Tomiyuki Arakawa; Tatsushi Hasegawa; Masatoshi Kagawa

doi:10.1117/1.1558392

1 April 2003 Optical waveguide fabrication by combination of spin-on-glass and plasma-enhanced chemical vapor deposition for optoelectronic integration

Tomiyuki Arakawa, Tatsushi Hasegawa, Masatoshi Kagawa

Author Affiliations +

Optical Engineering, Vol. 42, Issue 4, (April 2003). https://doi.org/10.1117/1.1558392

Low-loss optical waveguides for optoelectronic integration were realized by the combination of spin-on-glass (SOG) and plasma-enhanced chemical vapor deposition (PECVD). Undercladdings of 20-μm thickness together with cores of 6-μm height and 8-μm width were formed on Si substrates by PECVD and reactive ion etching. Overcladdings were formed by a combination of SOG and PECVD SiO₂ films. This method successfully filled narrow gaps between cores of optical circuits. The refractive index of overcladdings was adjusted by SOG curing and fluorine incorporation in PECVD SiO₂ films. A buried-type optical waveguide formed by the combination of SOG and PECVD showed single-mode propagation. Propagation losses and polarization dependent losses at the 1.3-μm wavelength were measured to be 0.3 dB/cm and below 0.15 dB, respectively.

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Tomiyuki Arakawa, Tatsushi Hasegawa, and Masatoshi Kagawa "Optical waveguide fabrication by combination of spin-on-glass and plasma-enhanced chemical vapor deposition for optoelectronic integration," Optical Engineering 42(4), (1 April 2003). https://doi.org/10.1117/1.1558392

Published: 1 April 2003

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