1 October 2003 Fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching
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Optical Engineering, 42(10), (2003). doi:10.1117/1.1604399
Abstract
We develop a method for the fabrication of optical structures in GaAs substrates using UV holographic lithography in SU-8 resist, processed to fabricate a mask, followed by chemically assisted ion-beam etching (CAIBE). The technique is based on simple processing steps without procedures of mask transfer, enabling easy fabrication of optical structures. A predevelopment relief behavior is investigated to optimize the processing parameter to form an etching mask in SU-8. By adjusting both exposure dose and time in the postexposure bake (PEB), an SU-8 mask with a flexible duty cycle and high profile quality can be easily produced. Furthermore, an optical structure with a rectangular shaped profile and a 1-μm period in a GaAs substrate is produced by optimizing the processing parameters during the CAIBE process.
Lin Pang, Wataru Nakagawa, Yeshaiahu Fainman, "Fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching," Optical Engineering 42(10), (1 October 2003). http://dx.doi.org/10.1117/1.1604399
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KEYWORDS
Photomasks

Gallium arsenide

Etching

Lithography

Scanning electron microscopy

Holography

Diffusion

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