1 December 2003 Fabrication method of Bragg gratings in silica channel optical waveguides
Author Affiliations +
Optical Engineering, 42(12), (2003). doi:10.1117/1.1625679
Abstract
Strong Bragg gratings are realized in silica channel optical channel waveguides by plasma-enhanced chemical vapor deposition and reactive ion etching. In the gratings, the insertion of 0.2-μm-thick SiO2 layers with a relatively low refractive index between the cores and claddings successfully yields high reflectance, high extinction ratio, and low polarization dependence.
Tomiyuki Arakawa, Yutaka Uno, Hideaki Ono, Hiromi Takahashi, Kentaro Harase, Hideaki Okayama, "Fabrication method of Bragg gratings in silica channel optical waveguides," Optical Engineering 42(12), (1 December 2003). http://dx.doi.org/10.1117/1.1625679
JOURNAL ARTICLE
2 PAGES


SHARE
KEYWORDS
Refractive index

Fiber Bragg gratings

Cladding

Waveguides

Reflectivity

Silica

Plasma enhanced chemical vapor deposition

Back to Top