1 December 2003 Fabrication method of Bragg gratings in silica channel optical waveguides
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Strong Bragg gratings are realized in silica channel optical channel waveguides by plasma-enhanced chemical vapor deposition and reactive ion etching. In the gratings, the insertion of 0.2-μm-thick SiO2 layers with a relatively low refractive index between the cores and claddings successfully yields high reflectance, high extinction ratio, and low polarization dependence.
© (2003) Society of Photo-Optical Instrumentation Engineers (SPIE)
Tomiyuki Arakawa, Tomiyuki Arakawa, Yutaka Uno, Yutaka Uno, Hideaki Ono, Hideaki Ono, Hiromi Takahashi, Hiromi Takahashi, Kentaro Harase, Kentaro Harase, Hideaki Okayama, Hideaki Okayama, } "Fabrication method of Bragg gratings in silica channel optical waveguides," Optical Engineering 42(12), (1 December 2003). https://doi.org/10.1117/1.1625679 . Submission:

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